unique machine's Album: China Polishing Machine Manufacturer

Today, China Polishing Machine manufacturers share the polishing methods? Mechanical polishing Mechanical polishing is a polishing method that removes the polished convex portion by plastic deformation on the surface of the material to obtain a smooth surface. Generally, oil stone strips, wool wheels, sandpaper, etc. are used, which are mainly manual operations, and special parts such as the surface of the rotating body can be used. Using an auxiliary tool such as a turntable, the method of super-fine polishing can be used with high surface quality requirements. Ultra-fine grinding and polishing is a special-purpose grinding tool. In the polishing liquid containing abrasive, it is pressed against the machined surface to perform high-speed rotary motion. With this technology, a surface roughness of Ra0.008 μm can be achieved, which is the highest among various polishing methods. This method is often used in optical lens molds. 2. Chemical polishing Chemical polishing is a process in which a portion of a material that is microscopically convex in a chemical medium is preferentially dissolved in a concave portion to obtain a smooth surface. The main advantage of this method is that it can polish a workpiece with complex shapes without complicated equipment, and can polish many workpieces at the same time with high efficiency. The core issue of chemical polishing is the formulation of the polishing fluid. The surface roughness obtained by chemical polishing is generally several 10 μm. 3. Electropolishing The basic principle of electropolishing is the same as chemical polishing, which is to selectively dissolve the surface of the material to make the surface smooth. Compared with chemical polishing, the effect of the cathode reaction can be eliminated, and the effect is good. The electrochemical polishing process is divided into two steps: a. Macro leveling The dissolved product diffuses into the electrolyte, and the surface roughness of the material decreases, Ra 1 μ m. b. Low light leveling Anodic polarization, surface brightness is improved, Ra

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